溅射功率对TiAlN涂层组织结构与性能的影响

2018-07-13

作者：左伟峰，赵广彬，程玺儒单位：西华大学

摘要：采用钛铝合金比为7:3的靶，通过非平衡磁控溅射离子镀制备TiAlN涂层。采用X射线衍射仪、扫描电子显微镜和MFT4000多功能材料表面性能试验机对膜层形貌成分、组织结构及硬度进行测试分析，分析溅射功率对TiAlN涂层组织和结构的影响。测试结果表明：随着溅射功率的减小，膜层晶粒结构变得更稀疏，结合力减弱，Al/Ti比值变小。

关键词：TiAlN涂层；离子镀；溅射功率；断口形貌

中图分类号：TG174.4； TH140.7文献标志码：A

Effect of Sputtering Power on Micro Structure and Structure of TiAlN Coating

Zuo Weifeng，Zhao Guangbin，Cheng Xiru

Abstract:TiAlN coatings are fabricated by unbalanced magnetron sputtering ion plating by using target which is composed of titanium aluminum alloy ratio 7:3.The micro structure and hardness of TiAlN coating are analyzed by Xray diffractometer，scanning electron microscope and MFT4000 multifunctional material surface testing machine.The influence of sputtering power on the structure and microstructure of TiAlN coating is analyzed.The results show that with the decrease of the sputtering power，the grain structure of the film becomes more sparse，binding force is weakened，Al/Ti ratio decreases.

Keywords:TiAlN coating；ion plating；sputtering power；fracture surface