基体偏压对磁控溅射制备CrAlN薄膜摩擦学性能的影响
2019-06-19
作者：王建伟1，薛玉君1，2，蔡海潮1，杜三明1
单位：1河南科技大学；2河南省机械设计及传动系统重点实验室
摘要：通过分析不同基体偏压下磁控溅射（PVD）CrAlN薄膜的结构特征、硬度规律及磨痕形貌，研究基体偏压对CrAlN薄膜的结构、硬度及摩擦磨损性能的影响。借助扫描电子显微镜（SEM）和原子力显微镜（AFM）观察CrAlN薄膜的表面形貌及三维形貌。采用纳米压痕仪对CrAlN薄膜的硬度进行测定。利用球盘式摩擦磨损试验机测定CrAlN薄膜的摩擦系数，并观察薄膜的磨痕形貌，分析薄膜的磨损机理。结果表明：当基体偏压低于150V时，薄膜表面颗粒的平均尺寸随偏压增大而逐渐减小；当基体偏压超过150V时，薄膜表面出现有明显的缺陷。随着基体偏压的增大，薄膜的硬度呈先升高后降低的趋势，并在基体偏压约为150V时达到最大值为27.5GPa；薄膜的摩擦系数呈先减小后增大的趋势，并在基体偏压约为150V时达到最小值0.25；磨痕呈不同程度的犁沟状，在基体偏压为150V时磨痕形貌平整且犁沟最小。当基体偏压为150V时，CrAlN薄膜的表面缺陷最小、硬度最大、摩擦系数低和综合性能最好，薄膜的磨损机理为磨粒磨损。
关键词：磁控溅射；基体偏压；CrAlN薄膜；硬度；摩擦磨损性能
中图分类号：TG174.4；TH140.7文献标志码：ADOI：10.3969/j.issn.1000-7008.2019.06.011
Effect of Substrate Bias on Friction and Wear Properties of
Magnetron Sputtered CrAlN Films
Wang Jianwei，Xue Yujun，Cai Haichao，Du Sanming
Abstract:The effect of substrate biases on the structure，hardness and friction and wear properties of CrAlN films，as well as the wear mechanism of CrAlN film，is to be studied by analyzing the structural characteristics，hardness regularity and wear scar morphology of magnetron sputtering (PVD) CrAlN films under different substrate biases.The surface morphology and threedimensional morphology of CrAlN films are observed by scanning electron microscopy (SEM) and atomic force microscopy (AFM).The hardness of CrAlN film is measured by nanoindenter.The friction coefficient of CrAlN film is measured by a balldisk friction and wear tester，and the wear profile of the film is observed，the wear mechanism of the film is analyzed.The results show that when the substrate bias voltage is lower than 150V，the average size of the particles on the surface of the film gradually decreases.When the substrate bias voltage exceeds 150V，the film surface has obvious defects.As the bias of the substrate increases，the hardness of the film increases first and then decreases，and reaches a maximum value of 27.5GPa when the substrate bias voltage is about 150V.The coefficient of friction of the film decreases first and then increases，and reaches a minimum of 0.25 when the substrate bias is about 150V.The wear scars have different degrees of furrows.When the substrate bias is 150V，the wear marks are flat and the furrow is the smallest.When the substrate bias voltage is 150V，the surface defects of CrAlN film are the smallest，the hardness is the largest，the friction coefficient is low，and the comprehensive performance is the best.The wear mechanism of the film is abrasive wear.
Keywords:magnetron sputtering；substrate biases；craln film；hardness；friction and wear properties