不同组分配比对剪切增稠抛光流体流变性能的影响
2020-10-22
作者：周培法1，2，姚鹏1，2，黄传真1，2，薛栋林3，4，邓伟杰3，4
单位：1山东大学机械工程学院；2高效洁净机械制造教育部重点实验室3中科院长春光学精密机械与物理研究所；4中科院光学系统先进制造技术重点实验室
摘要：为研究分散相质量分数、磨粒质量分数、磨粒粒径和分散介质种类对分散体系剪切增稠特性的影响，通过四因素三水平正交试验探究了不同组分含量下分散体系的流变性能，并通过极差分析得出各组分对剪切增稠特性的影响规律，最后进行抛光试验验证。结果表明，各组分对剪切增稠特性的影响由大到小依次为分散相质量分数、分散介质种类、磨粒粒径、磨粒质量分数。对于优选的组分配比，分散相质量分数30%、磨粒质量分数23%、磨粒粒径40nm、分散介质WSP200与WSP400复配，其峰值粘度达到临界点粘度的2.49倍。在抛光试验中，抛光液用量为5ml/min，硅片表面粗糙度Ra由68nm降至11nm，表明其能以较低的损耗实现硅片的精密抛光。
关键词：剪切增稠流体；正交试验；流变特性；硅片抛光
中图分类号：TG580.692；TH162.1文献标志码：ADOI：10.3969/j.issn.1000-7008.2020.07.002
Influence of Different Component Ratio on Rheological Properties
of Shear Thickening Polishing Fluid
Zhou Peifa，Yao Peng，Huang Chuanzhen，Xue Donglin，Deng Weijie
Abstract:To study the effects of mass fraction of dispersion phase，mass fraction and particle size of abrasive and type of dispersion medium on shear thickening properties of STF，the rheological properties of dispersion system with different component ratio are investigated by orthogonal experiments with four factors and three levels.The effect of each component on the shear thickening characteristics is obtained through the range analysis of the experimental data，and finally verified by the polishing test.The results show that the effect of each component on the shear thickening characteristics are in descending order of the dispersion phase mass fraction，the type of dispersion medium，the particle size of abrasive，and the mass fraction of abrasive.For the optimized component ratio，the mass fraction of dispersion phase is 30%，the mass fraction of abrasive is 23%，the particle size of abrasive is 40nm，and the dispersion medium is WSP200 and WSP400，the peak viscosity is 2.49 times that of the critical point.In the polishing experiment，when the amount of polishing fluid is 5ml/min，the surface roughness Ra of silicon wafer is reduced from 68nm to 11nm，which shows that it can achieve precision polishing of silicon wafer with low loss.
Keywords:shear thickening fluid (STF)；orthogonal experiment；rheological property；silicon wafer polishing