“反向设计”法研制ZrB2-Ni涂层及其性能研究
2021-02-24
作者:蒙德强1,王铁钢1,柯培玲2,刘艳梅1,曹斌3
单位:1天津职业技术师范大学,天津市高速切削与精密加工重点实验室;2中国科学院宁波材料技术与工程研究所,中国科学院海洋新材料与应用技术重点实验室;3天祝宏氟锂业科技发展有限公司
摘要:利用磁控溅射技术向ZrB2涂层中掺杂金属Ni来改善涂层韧性,采用“反向设计”法研制ZrB2Ni涂层,即通过改变ZrB2靶溅射功率调控ZrB2Ni涂层中Ni含量,系统研究涂层力学性能和摩擦磨损性能的变化规律,优化涂层制备工艺。结果表明:随着ZrB2靶溅射功率增加,涂层沉积速率呈线性增加;纳米硬度、弹性模量和平均摩擦系数逐渐升高;涂层临界载荷和磨损率均先增加后下降,但变化不大。适量掺杂金属Ni在一定程度上改善了涂层韧性,当ZrB2靶溅射功率为2.4kW时,制备的涂层临界载荷较高,约20.9N;涂层耐磨性最好,磨损率为4.3×10-1μm3/(N·μm),特征值H/E与H3/E*2最高,分别为0.066和0.075GPa。
关键词:磁控溅射技术;“反向设计”方法;ZrB2Ni涂层;靶溅射功率;纳米硬度
中图分类号:TG174.4;TH162文献标志码:ADOI:10.3969/j.issn.1000-7008.2021.02.004
Preparation and Property of ZrB2Ni Coating by Reverse Design Method
Meng Deqiang,Wang Tiegang,Ke Peiling,Liu Yanmei,Cao Bin
Abstract:The magnetron sputtering technology is used to dope metal Ni into the ZrB2 coating for improving coating toughness.The ZrB2Ni coating is prepared by reverse design method,namely the Ni content in the ZrB2Ni coating is adjusted by varying the ZrB2 target sputtering power,and their effects on the mechanical properties and tribological properties of ZrB2 coatings are systematically investigated to obtain the optimal coating preparation technology.The result shows that with the increasing of ZrB2 target sputtering power,the deposition rate increases approximately linearly;the nanohardness,elastic modulus and average friction coefficient gradually increase;the critical load and wear rate of ZrB2 coatings both increase first and then decrease,but the range varies little.The appropriate amount of Ni element doped into the ZrB2 coating can improve its toughness.When the ZrB2 target sputtering power is 2.4kW,the coating presents the optimum properties with the critical load of 20.9 N and the wear rate of 4.3×10-1μm3/(N·μm),corresponding to the best wear resistance.In this case,the characteristic values of H/E and H3/E*2 also keep highest values of 0.066 and 0.075GPa,respectively.
Keywords:magnetron sputtering technology;reverse design method;ZrB2Ni coating;target sputtering power;nanohardness